Search results for "Nanoimprint lithogra"

showing 4 items of 4 documents

Metasurfaces for colour printing

2014

We present a theoretical analysis and experimental evidences of metasurfaces based on particle resonators that achieve bright-field colour prints. We created pixels that support individual colours, miniaturized and juxtaposed at the optical diffraction limit. Different strategies are followed to offer the flexibility of using both transmitting and epi (reflective) white light sources. We discuss their potential applications in large-volume colour printing via nanoimprint lithography.

Flexibility (engineering)Materials sciencePixelOptical diffractionbusiness.industryNanoimprint lithographylaw.inventionResonatorOpticslawLimit (music)White lightParticleOptoelectronicsbusiness2014 16th International Conference on Transparent Optical Networks (ICTON)
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Nanoimprint lithography for organic electronics

2002

Thin films made of organic semiconductors (α-sexithiophene, PDAS and PBAS) have been printed and the impact on morphology studied by optical, atomic force and electron microscopy. Surfaces in contact with the stamp during printing undergo a change towards smoother and more ordered material at the macromolecular scale. Interdigitated nanoelectrodes to be used as source and drain in TFTs have been made and printed down to 100 nm. PDAS and PBAS can be printed at room temperature and preserve their printed feature provided they are cross-linked afterwards.

Organic electronicsMaterials scienceNanoimprint lithography; Oligothiophenes; Triaraylamines;oligothiophenesNanotechnologyCondensed Matter PhysicsAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsNanoimprint lithographylaw.inventionOrganic semiconductorlawtriaraylaminesNanoimprint lithogrananoimprint lithographyElectrical and Electronic EngineeringThin filmMicroelectronic Engineering
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Towards Plastic Electronics: Patterning Semiconducting Polymers by Nanoimprint Lithography

2002

The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.

chemistry.chemical_classificationMaterials sciencebusiness.industryMechanical EngineeringNanotechnologyPolymerNanoimprint lithographylaw.inventionchemistryMechanics of MaterialslawOptoelectronicsGeneral Materials SciencebusinessPlastic electronicsAdvanced Materials
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Exploring integration prospects of opal-based photonic crystals

2003

Different methods of functionalisation of thin opal films are discussed, including synthesis of opals on pre-patterned substrates, post-synthesis electron beam lithography, preparation of opals with heterogeneous photonic band gap structure and integrating opals with light sources. These approaches have been tested experimentally and key technological problems have been identified.

opalsMaterials scienceOPALSMechanical EngineeringMetals and AlloysNanotechnologyCondensed Matter PhysicsElectronic Optical and Magnetic Materialsfunctionalisationthin filmsMechanics of MaterialsOptical materialsphotonic crystalsMaterials Chemistrynanoimprint lithographyElectron-beam lithographyPhotonic crystalSynthetic Metals
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